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Deposition of TiN coatings using ACPVD technique on AM60 alloy | Recubrimientos de TiN depositados mediante ACPVD sobre aleaciones de magnesio AM60

机译:ACPVD技术在AM60合金上沉积TiN涂层| ACPVD在AM60镁合金上沉积的TiN涂层

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摘要

Magnesium alloys are reaching special interest due to their good specific properties, low cost and good manufacturing properties. However, their low hardness, wear and corrosion resistance limit their applications in certain sectors of industry. These drawbacks can be solved by applying hard ceramic coatings, such as nitrides or metal carbides. TiN is one of the most used coatings due to its high adhesion, hardness, low coefficient of friction and chemical stability. Physical vapor deposition by cathodic arc CAPVD, is a versatile technique, which uses low temperatures and high ionization energies, generating homogeneous coatings. To achieve coatings with high quality, a careful control of the manufacturing parameters is required, such as bias voltage, gas flow or intensity. This paper focuses on magnesium alloys, AM60, coated with TiN using physical vapor deposition cathodic arc technique (CAPVD) at different intensity values (40A and 100A) and surface preparation (grinding up to 4000 grit and polished to 3μm). It was included a final condition with an intermediate Al film. The samples were characterized by X-ray diffraction, roughness, optical microscopy and scanning electron.
机译:镁合金由于其良好的比性能,低成本和良好的制造性能而受到特别关注。但是,它们的低硬度,耐磨性和耐腐蚀性限制了它们在某些行业中的应用。这些缺点可以通过施加硬质陶瓷涂层(例如氮化物或金属碳化物)来解决。 TiN由于其高附着力,硬度,低摩擦系数和化学稳定性而成为最常用的涂料之一。通过阴极电弧CAPVD进行的物理气相沉积是一种通用技术,该技术利用低温和高电离能生成均匀的涂层。为了获得高质量的涂层,需要仔细控制制造参数,例如偏置电压,气体流量或强度。本文重点研究了镁镁合金AM60,它通过物理气相沉积阴极电弧技术(CAPVD)在不同强度值(40A和100​​A)和表面处理(研磨至4000粗砂并抛光至3μm)上涂有TiN。最终条件包括中间的铝膜。通过X射线衍射,粗糙度,光学显微镜和扫描电子对样品进行表征。

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